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Dual Acid Responses of Stable Luminescent Diphenylpyridylmethyl Radicals With Additional Pyridyl Groups
Yohei Hattori1, Kojiro Nakagawa1, Kingo Uchida2
1Division of Materials Science, Nara Institute of Science and Technology, Ikoma , Japan.
Abstract:
Polychlorinated diphenylpyridylmethyl radicals, exemplified by (3,5-dichloro-4-pyridyl)bis(2,4,6-trichlorophenyl)methyl radical (PyBTM), have garnered significant attention as stable radical emitters. Due to their halogenated pyridyl groups, these radicals also exhibit weak basicity and acid-responsive properties. To further explore and expand the acid-responsive behavior of PyBTM, we substituted additional pyridyl groups (3-pyridyl, 4-pyridyl, and 2-methoxy-3-pyridyl) for chlorine atoms at the para-positions relative to the methyl radical center. This modification yielded six novel, stable luminescent radicals. Spectroscopic analysis revealed distinct changes in absorption and emission profiles upon titration with a Brønsted acid (p-toluenesulfonic acid), a Lewis acid (tris(pentafluorophenyl)borane), and metal cations (Ag+, Zn2+, Cu2+). Complementary 1H NMR and DFT studies suggested that the 3-pyridyl and 4-pyridyl substituents act as stronger bases compared to PyBTM, whereas the basicity of the 2-methoxy-3-pyridyl is attenuated. The observed optical changes, including the emergence of new absorption bands and emission quenching, were rationalized using TD-DFT calculations.
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