Metal-Semiconductor Junctions
Design Example: Resistive Touchscreen
Back EMF
Equipotential Surfaces and Conductors
Charge on a Conductor
Electrostatic Boundary Conditions in Dielectrics
You might also read
Articles linked to this work by shared authors, journal, and citation graph.
Updated: May 8, 2026

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
Published on: December 5, 2015
Md Ashiqur Rahman Laskar1, Md Jayed Hossain1, Srijan Chakrabarti1
1School of Electrical, Computer, and Energy Engineering, Arizona State University, Tempe, AZ, 85281, USA. umberto.celano@asu.edu.
Electron-beam excited atomic force microscopy (EB-AFM) eliminates the need for physical back-contacts in electrical characterization. This non-destructive technique enables automated, wafer-scale metrology for advanced materials and devices.
Area of Science:
Background:
Purpose of the Study:
Main Methods:
Main Results:
Conclusions: