Advanced Characterization of 2D Materials Using SLEEM/ToF

Two-dimensional (2D) materials exhibit electronic and collective excitation properties that are highly sensitive to surface chemistry and thickness, requiring surface-sensitive characterization at low electron energies. Here, we investigate graphene, hexagonal boron nitride (h-BN), molybdenum disulfide (MoS₂), and titanium carbide (Ti₃C₂) MXene using an advanced home-built scanning low-energy electron microscopy system combined with time-of-flight electron spectroscopy (SLEEM/ToF). The system uniquely records electron energy-loss spectra (EELS) from transmitted electrons rather than from the reflected electrons used in conventional SLEEM. Compared with high-energy EELS, our low-energy ToF-EELS approach offers enhanced surface sensitivity and reduced beam-induced damage, enabling direct probing of π and π + σ plasmon excitations. Additionally, complementary techniques, including scanning transmission electron microscopy (STEM), Raman spectroscopy, and X-ray photoelectron spectroscopy (XPS), were employed to characterize structural and chemical properties. EELS were acquired for all investigated 2D materials at electron landing energies of 500-1500 eV, and in the 5-50 eV range for selected materials, including graphene and MoS₂. Analysis of these spectra enabled determination of the average plasmon positions across the measured energy range for all studied materials. Furthermore, a quantitative determination of the inelastic mean free path (IMFP) was achieved for graphene in the 10-50 eV range, yielding a value of 1.9 ± 0.2 nm. These results demonstrate the potential of SLEEM-ToF for surface-sensitive analysis of 2D materials.