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Published on: June 8, 2018
Enhanced Modulation of Terahertz Generation in Optically Pumped Silicon-Based CoFeB/Ir Heterostructures
Ruijie Peng1, Zuanming Jin1,2, Yexing Jiang1
1Terahertz Technology Innovation Research Institute, Terahertz Spectrum and Imaging Technology Cooperative Innovation Center, Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China.
None:
Silicon-compatible spintronic terahertz emitters (STEs) are crucial for on-chip ultrafast optoelectronic integration, yet their all-optical controllability remains a key challenge. Here, we fabricate a Ta-buffered CoFeB/Ir heterostructure on Si substrates and realize, for the first time, the enhancement and nonlinear modulation of coherent THz emission under continuous-wave (CW) optical pumping at room temperature. The THz emission, dominated by the inverse spin Hall effect, features an ultrabroad 0-2.5 THz bandwidth and robustness against femtosecond pump fluence and polarization variations. The all-optical modulation of THz generation originates from the competition between photothermal and photodoping effects in the Si substrate. The heterostructure-side pumping with a 450 nm CW laser yields an increased modulation of 46% at 2.546 W cm-2 due to the photothermal effect, while the Si substrate-side pumping at 780 nm leads to 21.3% THz emission suppression by photodoping. Moreover, the THz enhanced modulation efficiency peaks at an Ir layer thickness of 1.2 nm. Our work demonstrates an all-optical controllable Si-based THz source, providing critical insights for the design of next-generation on-chip THz functional devices.
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