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Updated: May 27, 2026

Imine Metathesis by Silica-Supported Catalysts Using the Methodology of Surface Organometallic Chemistry
Published on: October 18, 2019
Shape resonances in silane and fluorinated silanes
Hrishikesh Rajbongshi1, Deepak Kumar1, Mwdansar Banuary1
1Department of Chemistry, Indian Institute of Technology Guwahati, Assam, India. gupta@iitg.ac.in.
Abstract:
Low-energy electrons with silane and fluorinated silanes are central to plasma-enhanced deposition and etching processes. The shape resonances in these compounds are investigated using the complex absorbing potential method. The key aspect is to locate the resonant state within a sea of continuum states, and this is achieved by applying the nuclear charge stabilisation method in conjunction with the parametric equations of motion. The SiH4 resonance energy is in reasonable agreement with the electron transmission spectroscopy data, while the SiF4 resonance explains the low-energy peak in the total scattering cross sections. Successive fluorination leads to an increase in both resonance position and width.
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