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Updated: May 27, 2026

Imine Metathesis by Silica-Supported Catalysts Using the Methodology of Surface Organometallic Chemistry
Published on: October 18, 2019
Shape resonances in silane and fluorinated silanes.
Hrishikesh Rajbongshi1, Deepak Kumar1, Mwdansar Banuary1
1Department of Chemistry, Indian Institute of Technology Guwahati, Assam, India. gupta@iitg.ac.in.
Low-energy electron interactions with silane and fluorinated silanes are crucial for plasma processes. This study identifies shape resonances, enhancing understanding of electron scattering in these compounds.
Area of Science:
- Plasma physics
- Quantum chemistry
- Materials science
Background:
- Low-energy electrons interacting with silane (SiH4) and fluorinated silanes (e.g., SiF4) are fundamental to plasma-enhanced deposition and etching.
- Understanding electron-molecule resonances is key to controlling plasma processes.
Purpose of the Study:
- Investigate shape resonances in silane and fluorinated silanes.
- Relate resonance properties to experimental observations in plasma processes.
Main Methods:
- Utilized the complex absorbing potential method.
- Employed the nuclear charge stabilization method with parametric equations of motion to locate resonant states within continuum states.
Main Results:
- Calculated resonance energy for SiH4 shows good agreement with electron transmission spectroscopy data.
- Identified a SiF4 resonance explaining the low-energy peak in total scattering cross sections.
- Observed that increasing fluorination shifts resonance position and increases resonance width.
Conclusions:
- The study successfully located and characterized shape resonances in silane and fluorinated silanes.
- Findings provide insights into electron scattering mechanisms relevant to plasma-enhanced deposition and etching.
- The results offer a theoretical basis for understanding the impact of fluorination on plasma process behavior.
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