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Closed-loop high-precision two-photon lithography based on a multiplexed single-cavity dual-comb laser.

Yalan Yu¹, Zhiwei Zhu¹, Benjamin Willenberg²

¹Department of Mechanical and Automation Engineering, The Chinese University of Hong Kong, Shatin, N.T., Hong Kong.

Nature Communications

|June 3, 2026

Summary

This study introduces a dual-comb laser system for real-time correction in two-photon lithography, enhancing nanomanufacturing reproducibility. The closed-loop platform achieves high-precision fabrication of optical elements with minimal errors.

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Area of Science:

Optics and Photonics
Nanotechnology
Manufacturing Engineering

Background:

Two-photon lithography (TPL) offers high resolution but suffers from poor reproducibility and manual tuning.
Current metrology methods like scanning electron microscopy are post-fabrication and cannot prevent errors.
Industrial adoption of TPL is limited by these challenges.

Purpose of the Study:

To develop a real-time correction system for two-photon lithography to improve reproducibility and precision.
To enable automated error correction during the fabrication process.
To demonstrate a scalable and cost-effective solution for high-yield nanomanufacturing.

Main Methods:

Utilized a single-cavity dual-comb laser system for TPL.
Integrated in-situ phase measurements at 360 Hz across the full field during fabrication.
Implemented a dynamic model for real-time feedback and modulation of printing parameters.
Demonstrated continuous fabrication over 14 hours.

Main Results:

Achieved less than 100-nm absolute errors in millimeter-scale diffractive optical elements.
Fabricated devices exhibited superior signal-to-noise ratios and focus quality.
Demonstrated high process repeatability and yield.

Conclusions:

The closed-loop dual-comb laser platform enables real-time error correction in TPL.
This technology significantly enhances precision and reproducibility in nanomanufacturing.
Offers a scalable and cost-effective solution for industrial applications.