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Enabling 3D Printing of Space-Durable High-Performance Polymers: Low Earth Orbit Exposure.

Eitan Grossman1, Yuval Vidavsky2, Nurit Atar2

  • 1NOGA 3D Innovations, 17 Hamelacha Street, Rosh Ha'ain 4809146, Israel.

ACS Applied Materials & Interfaces
|June 9, 2026
PubMed
Summary

New hybrid photopolymers with polyhedral oligomeric silsesquioxane (POSS) significantly reduce erosion from atomic oxygen (AO) in space. These advanced materials offer durable, 3D-printable components for reliable long-term space missions.

Keywords:
3D printingMISSE-17POSSadditive manufacturingbismaleimidecyanate esterspace environment

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Area of Science:

  • Materials Science
  • Space Engineering
  • Additive Manufacturing

Background:

  • The new space sector demands advanced materials for reliable and cost-effective space technologies.
  • Conventional polymers degrade in the harsh space environment, facing challenges like atomic oxygen (AO) exposure, radiation, and thermal fluctuations.
  • Additive manufacturing (AM) offers potential for lightweight, complex structures, but material limitations hinder its space applications.

Purpose of the Study:

  • To develop novel hybrid photopolymers for digital light processing (DLP) 3D printing suitable for the space environment.
  • To enhance material durability against atomic oxygen (AO) by incorporating polyhedral oligomeric silsesquioxane (POSS).
  • To evaluate the performance and stability of these materials after space exposure.

Main Methods:

  • Development of hybrid photopolymers using cyanate ester (CE) and extended bismaleimide (E-BMI) with UV-curable POSS.
  • Digital Light Processing (DLP) 3D printing of material specimens.
  • Exposure of printed samples to the space environment aboard the International Space Station (ISS) for 145 days (MISSE-17 mission).
  • Analysis of material degradation (AO erosion), surface characteristics, and mechanical/thermomechanical properties post-exposure.

Main Results:

  • POSS-containing samples showed up to 78% less AO-induced erosion compared to controls.
  • In-situ formation of a protective silicon dioxide (SiO2) passivation layer was confirmed on POSS-enhanced samples.
  • Printing orientation influenced AO reactivity and surface degradation, indicating the need for geometry-dependent optimization.
  • Mechanical and thermomechanical properties remained stable after 145 days in low-Earth orbit (LEO).

Conclusions:

  • CE/E-BMI-POSS hybrid photopolymers demonstrate significant AO resistance, crucial for LEO applications.
  • The formation of SiO2 passivation layers effectively protects materials in space.
  • These materials are suitable for durable, high-resolution DLP 3D-printed components for long-term space missions.