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Related Experiment Video

Updated: Jun 11, 2026

Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station
05:57

Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station

Published on: April 1, 2020

Optical Fourier Surfaces for Integrated Photonics.

Daniel Petter1, Fabian Kaufmann2, Daniel Chelladurai3

  • 1Department of Mechanical and Process Engineering, ETH Zurich, 8092 Zurich, Switzerland.

ACS Nano
|June 9, 2026
PubMed
Summary
This summary is machine-generated.

Grayscale fabrication of optical Fourier surfaces (OFSs) enables advanced integrated photonics. This method allows for more efficient and compact devices on silicon and lithium niobate platforms.

Keywords:
Bragg filterhigh-Q cavityintegrated photonicssecond harmonic generationthermal scanning-probe lithographythin-film lithium niobate

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Area of Science:

  • Photonics and Optical Engineering
  • Materials Science
  • Nanotechnology

Background:

  • Integrated photonics relies on miniaturized optical elements.
  • Traditional lithography limits optical elements to binary height profiles.
  • Grayscale fabrication offers enhanced control and efficiency.

Purpose of the Study:

  • To demonstrate photonic integrated circuits using grayscale optical Fourier surfaces (OFSs).
  • To explore the capabilities of wavy height profiles in silicon-on-insulator and thin-film lithium niobate.
  • To create efficient and compact optical devices with advanced functionalities.

Main Methods:

  • Utilizing grayscale fabrication techniques, specifically thermal scanning-probe lithography and dry etching.
  • Designing and implementing intuitive schemes for OFS elements.
  • Fabricating devices on silicon-on-insulator and thin-film lithium niobate platforms.

Main Results:

  • Demonstrated sinusoidal Bragg reflectors in silicon waveguides with up to 44 dB extinction ratio.
  • Fabricated high-quality factor cavities (1.6 × 10^5) in lithium niobate waveguides.
  • Achieved second harmonic generation in lithium niobate utilizing high-Q cavities and nonlinear properties.

Conclusions:

  • Grayscale OFS fabrication is a high-fidelity method for advanced integrated photonic devices.
  • This technique enables the creation of efficient, compact devices with tailored optical responses.
  • The demonstrated devices showcase potential for next-generation quantum and classical optical technologies.