Related Experiment Video
Updated: Jun 13, 2026
05:38
Micromechanical Tension Testing of Additively Manufactured 17-4 PH Stainless Steel Specimens
Published on: April 7, 2021
Chemical Mechanical Lapping of 316 Based on Solid-Phase Fenton Reaction
Luguang Guo1,2, Kangyi Zhou1,2, Yaxin Tian1,2
1College of Mechanical Engineering, Quzhou University, Quzhou 324000, China.
Materials (Basel, Switzerland)
|June 12, 2026
Summary
A novel solid-phase Fenton chemo-mechanical lapping (SF-CML) method enhances stainless steel processing. This technique achieves high material removal rates and superior surface quality, outperforming traditional methods.
Area of Science:
- Materials Science
- Chemical Engineering
- Surface Engineering
Background:
- Achieving high material removal rates (MRR) and excellent surface quality simultaneously is a challenge in metallic material processing.
- Conventional homogeneous Fenton systems for chemical mechanical polishing (CMP) suffer from precipitation and low efficiency.
- There is a need for advanced processing techniques for precision finishing of metallic materials.
Purpose of the Study:
- To propose and evaluate a novel solid-phase Fenton chemo-mechanical lapping (SF-CML) method.
- To investigate the effectiveness of SF-CML for high-efficiency precision processing of 316 stainless steel.
- To compare SF-CML performance against conventional homogeneous Fenton CMP and pure mechanical lapping.
Main Methods:
- Developed a solid lapping tool incorporating Fe3O4 microparticles for synergy with an H2O2-based slurry.
- Applied SF-CML under locally high-pressure and high-temperature conditions to generate hydroxyl radicals (·OH).
- Utilized X-ray Photoelectron Spectroscopy (XPS) and Electron Paramagnetic Resonance (EPR) for surface and radical characterization.
Main Results:
- Optimized SF-CML at pH 2.5 and 0.05 wt% H2O2 yielded a maximum MRR of 16.64 μm/min and a surface roughness (Sa) of 20.95 nm.
- Characterization confirmed the oxidation of the stainless steel surface and the presence of ferrous ions and hydroxyl radicals.
- SF-CML demonstrated significantly improved removal efficiency and enhanced surface quality compared to homogeneous Fenton CMP and mechanical lapping.
Conclusions:
- The solid-phase Fenton reaction effectively catalyzes the generation of hydroxyl radicals for material removal.
- SF-CML provides a new pathway for high-efficiency precision processing of metallic materials, overcoming limitations of traditional Fenton systems.
- This method offers a viable solution for achieving both high material removal rates and excellent surface finish.
