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Direct Visualization of MOF Film CVD Growth Using a Dual-Heating Zone In Situ TEM Microreactor.

Shaotong Hu^1,2, Muyu Yan¹, Ming Li^1,2

¹State Key Lab of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China.

|June 18, 2026

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A new dual-heating-zone in situ transmission electron microscopy (TEM) reactor allows real-time nanoscale visualization of chemical vapor deposition (CVD) processes. This advanced reactor reveals metal-organic framework (MOF) growth kinetics, showing island growth rather than layer-by-layer deposition.

Area of Science:

Materials Science
Nanotechnology
Chemical Engineering

Background:

Real-time nanoscale visualization of chemical vapor deposition (CVD) is crucial for materials preparation but is limited by conventional in situ transmission electron microscopy (TEM) reactors.
Existing single-heating-zone reactors fail to accurately replicate precursor vaporization and deposition conditions.

Purpose of the Study:

To develop and demonstrate a novel dual-heating-zone in situ TEM chip for realistic CVD process simulation.
To enable direct nanoscale visualization of metal-organic framework (MOF) film growth kinetics under controlled conditions.

Main Methods:

Introduction of the TempTwin CVD-Reactor, a dual-heating-zone gas-phase in situ TEM chip with independently controlled source and deposition regions.
Utilizing ultrathin silicon nitride windows for angstrom-level resolution imaging at temperatures up to 900 °C.

Keywords:

Chemical vapor deposition (CVD)in situ TEM metal−organic frameworks (MOFs)microelectromechanical systems (MEMS)microreactor

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Quantitative tracking of shell-thickness evolution and composition analysis using energy-dispersive X-ray spectroscopy.

Main Results:

Direct visualization of ZIF-8 (a type of MOF) CVD deposition on ZnO nanowires.
Observation that ZIF-8 deposition follows a Volmer-Weber island growth mode (nucleation and coalescence), not a layer-by-layer mechanism.
Successful simulation of key CVD conditions for MOF growth, providing insights into gas-solid reaction mechanisms.

Conclusions:

The TempTwin CVD-Reactor accurately simulates realistic CVD conditions for MOF growth.
The study provides critical insights into the gas-solid reaction mechanisms governing MOF film formation.
This technology advances the in situ TEM capabilities for studying nanoscale material synthesis processes.