Interdiffusion at the Molybdenum-TEOS Interface in Flat and Nanostructured Systems during Graphene CVD.

Area of Science:

• Materials Science
• Nanotechnology
• Surface Science

Background:

• Graphene integration with metallic layers creates versatile hybrid materials for electronics and optics.
• Understanding interfacial phenomena is crucial for controlling graphene synthesis.

Purpose of the Study:

• Investigate interdiffusion at the molybdenum-SiO2 interface during graphene growth.
• Determine the effect of catalyst geometry on graphene layer formation.

Main Methods:

• Graphene growth via chemical vapor deposition (CVD) on flat and nanostructured molybdenum films.
• Characterization using Rutherford backscattering spectrometry, secondary ion mass spectrometry, X-ray diffraction, and electron microscopy.

Main Results:

• Flat molybdenum films yielded ~15 graphene layers with unidirectional interdiffusion.
• Nanostructured molybdenum underwent dewetting, forming ~5 graphene layers due to multidirectional interdiffusion and silicon incorporation.

Conclusions:

• Catalyst geometry critically influences graphene thickness and growth.
• Interfacial diffusion and surface morphology are key factors in controlling graphene growth on metal-oxide substrates.