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Interdiffusion at the Molybdenum-TEOS Interface in Flat and Nanostructured Systems during Graphene CVD.

S Zappalà1,2, M Scuderi1, S Mirabella3

  • 1Consiglio Nazionale delle Ricerche - Istituto per la Microelettronica e Microsistemi (CNR-IMM), Z.I. VIII Strada, 5, Catania 95121, Italy.

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Summary

Catalyst geometry significantly impacts graphene growth. Nanostructured molybdenum dewetting reduces graphene layers, unlike flat films, due to multidirectional interdiffusion and silicon incorporation.

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Surface Science

Background:

  • Graphene integration with metallic layers creates versatile hybrid materials for electronics and optics.
  • Understanding interfacial phenomena is crucial for controlling graphene synthesis.

Purpose of the Study:

  • Investigate interdiffusion at the molybdenum-SiO2 interface during graphene growth.
  • Determine the effect of catalyst geometry on graphene layer formation.

Main Methods:

  • Graphene growth via chemical vapor deposition (CVD) on flat and nanostructured molybdenum films.
  • Characterization using Rutherford backscattering spectrometry, secondary ion mass spectrometry, X-ray diffraction, and electron microscopy.

Main Results:

  • Flat molybdenum films yielded ~15 graphene layers with unidirectional interdiffusion.
  • Nanostructured molybdenum underwent dewetting, forming ~5 graphene layers due to multidirectional interdiffusion and silicon incorporation.

Conclusions:

  • Catalyst geometry critically influences graphene thickness and growth.
  • Interfacial diffusion and surface morphology are key factors in controlling graphene growth on metal-oxide substrates.