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Laser Micromachining for Polymer Surface Topography Design
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Published on: September 19, 2025

High-performance topochemical polymerization-based photo-carving with sub-50 nm resolution utilizing visible light.

Yangyang Ren1,2, Zhenglian Qin2,3, Yuchao Li4

  • 1Key Laboratory of Photochemistry, CAS Research/Education Center for Excellence in Molecular Sciences, Institute of Chemistry, Chinese Academy of Sciences, Beijing, China.

Nature Communications
|June 25, 2026
PubMed
Summary

This study introduces a new method for high-resolution photolithography using lattice-controlled polymerization. It achieves sub-50 nm resolution with low-power visible light, overcoming limitations of current lithographic technologies.

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Area of Science:

  • Materials Science
  • Polymer Chemistry
  • Nanotechnology

Background:

  • Photosensitive topochemical polymerization offers a route to high-performance polymers for advanced lithography.
  • Achieving precise molecular packing and large single-crystal films for topochemical reactions is a significant challenge.
  • Current methods struggle to meet the demands of sub-diffraction, low-power lithographic technologies.

Purpose of the Study:

  • To develop a lattice-induced resolution enhancement method for topochemical polymerization.
  • To enable efficient 2D and 3D lithography using a dual solid-liquid interface confinement strategy.
  • To demonstrate sub-diffractional lithographic resolution with low-power light sources.

Main Methods:

  • Utilized a lattice-induced resolution enhancement technique.
  • Employed a dual solid-liquid interface confinement strategy to control fluid flow and suppress nucleation.
  • Fabricated large-area single-crystal thin-film photoresists with tunable properties.
  • Demonstrated dual-mode photocarving using a low-power continuous-wave visible laser.

Main Results:

  • Achieved sub-50 nm resolution (λ/10), exceeding the diffraction limit.
  • Demonstrated efficient topochemical polymerization in both 2D and 3D applications.
  • Fabricated large-area single-crystal thin-film photoresists with controlled thickness and aspect ratios.
  • Operated at significantly lower power levels (4-20 μW) compared to traditional methods like two-photon lithography.
  • Showcased a fivefold resolution enhancement over existing photoresists under identical conditions.

Conclusions:

  • The developed method provides a versatile platform for sub-diffractional lithography with low-power light.
  • This approach overcomes key obstacles in topochemical polymerization for advanced lithographic applications.
  • The process is compatible with standard optical microscopes and components, offering practical advantages.