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Updated: Jun 27, 2026
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Laser Micromachining for Polymer Surface Topography Design
Published on: September 19, 2025
High-performance topochemical polymerization-based photo-carving with sub-50 nm resolution utilizing visible light
Yangyang Ren1,2, Zhenglian Qin2,3, Yuchao Li4
1Key Laboratory of Photochemistry, CAS Research/Education Center for Excellence in Molecular Sciences, Institute of Chemistry, Chinese Academy of Sciences, Beijing, China.
Nature Communications
|June 25, 2026
Summary
This study introduces a new method for high-resolution photolithography using lattice-controlled polymerization. It achieves sub-50 nm resolution with low-power visible light, overcoming limitations of current lithographic technologies.
Area of Science:
- Materials Science
- Polymer Chemistry
- Nanotechnology
Background:
- Photosensitive topochemical polymerization offers a route to high-performance polymers for advanced lithography.
- Achieving precise molecular packing and large single-crystal films for topochemical reactions is a significant challenge.
- Current methods struggle to meet the demands of sub-diffraction, low-power lithographic technologies.
Purpose of the Study:
- To develop a lattice-induced resolution enhancement method for topochemical polymerization.
- To enable efficient 2D and 3D lithography using a dual solid-liquid interface confinement strategy.
- To demonstrate sub-diffractional lithographic resolution with low-power light sources.
Main Methods:
- Utilized a lattice-induced resolution enhancement technique.
- Employed a dual solid-liquid interface confinement strategy to control fluid flow and suppress nucleation.
- Fabricated large-area single-crystal thin-film photoresists with tunable properties.
- Demonstrated dual-mode photocarving using a low-power continuous-wave visible laser.
Main Results:
- Achieved sub-50 nm resolution (λ/10), exceeding the diffraction limit.
- Demonstrated efficient topochemical polymerization in both 2D and 3D applications.
- Fabricated large-area single-crystal thin-film photoresists with controlled thickness and aspect ratios.
- Operated at significantly lower power levels (4-20 μW) compared to traditional methods like two-photon lithography.
- Showcased a fivefold resolution enhancement over existing photoresists under identical conditions.
Conclusions:
- The developed method provides a versatile platform for sub-diffractional lithography with low-power light.
- This approach overcomes key obstacles in topochemical polymerization for advanced lithographic applications.
- The process is compatible with standard optical microscopes and components, offering practical advantages.
