Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Experiment Video

Updated: Jun 27, 2026

Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting
10:49

Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting

Published on: January 23, 2013

An Integrated Physics-Based and Data-Driven Framework for Defect Prediction in Advanced Nanoimprint Lithography

Jean Chien1, Eric Lee1

  • 1Department of Chemical Engineering, National Taiwan University, Taipei 10617, Taiwan.

Micromachines
|June 26, 2026
PubMed
Summary
This summary is machine-generated.

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Pharmacotherapeutic Interventions for Sensorineural Hearing Loss: A Scoping Review.

Audiology research·2026
Same author

CT Hounsfield Unit Measurements Around the Hip and Their Utility for Opportunistic Screening: A Systematic Review.

Journal of the American Academy of Orthopaedic Surgeons. Global research & reviews·2026
Same author

Double Thionation of 4-Dimethylaminophthalimide Leads to the Development of a Highly Effective Photosensitizer.

Chemistry (Weinheim an der Bergstrasse, Germany)·2026
Same author

A systematic review of gender and ethnicity in varicose vein and venous leg ulcer management.

Journal of vascular surgery. Venous and lymphatic disorders·2026
Same author

Long-Term Outcomes of Endoscopic Submucosal Dissection for Esophageal Squamous High-Grade Dysplasia and Early Squamous Cell Carcinoma in the West: Absolute vs Outside Criteria.

Clinical gastroenterology and hepatology : the official clinical practice journal of the American Gastroenterological Association·2026
Same author

Non-Surgical and Surgical Management of Peri-Implant Diseases and Defects in Zirconia Implants: A Scoping Review.

The International journal of oral & maxillofacial implants·2026
Same journal

Correction: Kang et al. Fluid Flow to Electricity: Capturing Flow-Induced Vibrations with Micro-Electromechanical-System-Based Piezoelectric Energy Harvester. <i>Micromachines</i> 2024, <i>15</i>, 581.

Micromachines·2026
Same journal

Femtosecond Laser Texturing of Wood Coatings with Bio-Based Epoxy and Wax Additives for Enhanced Hydrophobicity.

Micromachines·2026
Same journal

Engineering of Optoelectronic Devices for Renewable Energy Applications.

Micromachines·2026
Same journal

Phase Transformation and Electrochemical Behavior of Hexagonal TiO<sub>2</sub> Nanotubes Under Different Annealing Temperatures and Heating Rates.

Micromachines·2026
Same journal

Process Optimization and Predictive Modeling of Femtosecond Laser Precision Milling for Commercial PMMA Slices.

Micromachines·2026
Same journal

A Hybrid Preprocessing Multi-Objective Surrogate Model for Thermal MEMS Actuators.

Micromachines·2026
See all related articles

This study introduces a physics-based and data-driven framework for predicting defects in nanoimprint lithography (NIL). The approach enables virtual inspection of semiconductor designs before manufacturing to identify potential yield risks.

Area of Science:

  • Materials Science
  • Nanotechnology
  • Semiconductor Manufacturing

Background:

  • Advanced nanoimprint lithography (NIL) offers high-resolution semiconductor patterning but faces yield loss due to accumulated distortions.
  • Defects in NIL arise from complex interactions during coating, exposure, etching, and imprinting processes.

Purpose of the Study:

  • To develop an integrated framework for pre-manufacturing defect-risk prediction in NIL.
  • To enable early identification and mitigation of yield risks in advanced semiconductor fabrication.

Main Methods:

  • An integrated framework combining a physics-based process twin and a data-driven risk prediction model (physics-augmented CNN with conformal uncertainty calibration).
  • Utilizing an NDA-safe layout database and simulating sequential process steps: spin coating, electron-beam lithography (EBL), reactive ion etching (RIE), and imprinting.
Keywords:
defect predictionelectron-beam lithography (EBL)nanoimprint lithography (NIL)physics-augmented convolutional neural networkphysics-based process twinreactive ion etching (RIE)uncertainty calibrationvirtual inspection

More Related Videos

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
07:47

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

Related Experiment Videos

Last Updated: Jun 27, 2026

Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting
10:49

Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting

Published on: January 23, 2013

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
07:47

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

  • Generating physically consistent parameter maps from design layouts for downstream machine learning.

    • Main Results:

    • Demonstrated an end-to-end virtual inspection flow converting layouts into spatially resolved risk maps prior to fabrication.
    • Revealed that local pattern density significantly influences risk distribution, beyond nominal geometry.
    • Highlighted the importance of the local pattern environment in governing manufacturability.

    Conclusions:

    • The proposed framework provides a physically interpretable method for early yield-risk screening in advanced NIL.
    • Pre-manufacturing virtual inspection is crucial for optimizing semiconductor fabrication processes.
    • Understanding pattern environment interactions is key to improving NIL yield and reliability.