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Updated: Jul 2, 2026

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

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Electron Affinity of UF6

Burak A Tufekci1, Shiying Wang1, Lan Cheng1

  • 1Department of Chemistry, The Johns Hopkins University, Baltimore, Maryland 21218, United States.

Journal of the American Chemical Society
|July 1, 2026
PubMed

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