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Updated: Jul 3, 2026

Patterning via Optical Saturable Transitions - Fabrication and Characterization
Published on: December 11, 2014
This study introduces a new method using double Zernike (DZ) polynomials and nodal aberration sensitivity (NAS) to improve off-axis optical system design. The method enhances robustness against alignment errors, significantly reducing wavefront errors in complex systems.
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