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Light Enhanced Hydrofluoric Acid Passivation: A Sensitive Technique for Detecting Bulk Silicon Defects
Published on: January 4, 2016
F-Interstitial passivation preserves host-like optoelectronic properties in 229Th:YLF nuclear-clock platforms
1Independent Researcher, Stephenville, Newfoundland and Labrador, Canada. sa.shobeyri@gmail.com.
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In this work, we use density-functional theory to study charge compensation in 229Th:LiYF4 and its impact on the optoelectronic response. We compare three Li-vacancy configurations (near, mid, and far from Th) with an adjacent fluorine interstitial (Fi). The near vacancy has the lowest formation energy, while Fi is only 0.11 eV higher, and the mid and far vacancies are significantly less favorable. We find a clear mechanism-level contrast between vacancy- and interstitial-based compensation: vacancy-induced changes reduce the local electrostatic (Madelung) field and shift Th d/f character toward the band edges, narrowing the gap, whereas Fi screens the Th center and preserves a more host-like gap without introducing midgap states. Local PDOS including spin-orbit coupling supports this passivating behavior, and optical ε2(ω) shows transparency near the 8.36 eV nuclear-transition energy; importantly, only the Fi route maintains a host-like absorption edge. Overall, Fi emerges as an energetically competitive passivation route that preserves host-like optoelectronic behavior among the charge-compensation paths considered here.

