Related Experiment Video
Updated: Jul 9, 2026

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
Published on: May 13, 2020
Bis(Formazanate) Nickel(II) Complex as a Promising Active Material for Resistive Random Access Memory Device: Impact
Sunita Birara1, Shalu Saini2, Anita Saran1
1Department of Chemistry, Indian Institute of Technology Jodhpur, Rajasthan, India.
Abstract:
A mononuclear bis(formazanate) Ni(II) complex 1, [NiIIL2], with a redox-active formazan ligand, 1-(benzothiazol-2-yl)-5-(2-benzoyl-4-chlorophenyl)-3-phenyl, LH, was designed, synthesized, and structurally characterized in detail by numerous characterization techniques, including the single-crystal x-ray diffraction (SCXRD) technique. As evidenced by SC-XRD, complex 1 exists in an octahedral geometry, with the nickel (II) center being surrounded by two tridentate formazanate ligands. The cyclic voltammogram of the Ni(II) complex displays reversible redox events involving both the ligand and the metal center, highlighting the ability of the complex to undergo both oxidation and reduction processes. The [NiIIL2] complex was additionally utilized as the active material to construct a resistive switching memory device, Ag/NiIIL2/FTO, which exhibited excellent resistance switching behaviour with a high ION/IOFF ratio (104), low switching voltage, and admirable endurance stability (450 cycles) for nonvolatile memory based on emerging materials.

