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Mechanistic evaluation of amorphous InGaZnO-based one transistor-one capacitor memory cell via fast current-voltage
Juneseong Choi1, Minsub Um1, Hyobin Park2
1Department of Materials Science and Engineering and Inter-University Semiconductor Research Center, Seoul National University, Gwanak-ro 1, Gwanak-gu, Seoul 08826, Republic of Korea. cheolsh@snu.ac.kr.
None:
This study reports the fabrication and analysis of prototype one-transistor-one-capacitor (1T-1C) dynamic random-access memory (DRAM) cells with an amorphous indium-gallium-zinc oxide channel. Fast current-voltage measurements, supported by the H simulation program with integrated circuit emphasis (HSPICE), were used to examine transient charging and discharging operation in a laboratory-scale single-cell structure measured without an integrated sense amplifier. Distinct transient peaks in the measured current-time waveforms allowed for the direct extraction of the charge stored and released from the 1T-1C structure. Retention tests demonstrated that this transient method can monitor charge loss, with the stored charge retained within a loss of ∼1% over hold times of up to 3000 seconds. HSPICE simulations reconstructed the storage node potential (VS) and reproduced the major transient features, supporting the accuracy of the capacitance network interpretation. The analysis showed that parasitic capacitances within the 1T-1C device deviated the VS from the bit-line voltage, decreasing the sensing margin. This effect became more pronounced as parasitic capacitances increased for the given storage capacitance. This combined experimental and simulation framework provides a practical method for evaluating charging/discharging behavior and parasitic-coupling effects in prototype AOS-based 1T-1C memory cells.
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