Dual-pathway mask ranking guided selective fine-tuning for backdoor purification

Rong Huang1, Xinming Cheng2, Isao Echizen3

  • 1School of Information and Intelligent Science, Donghua University, Shanghai, 201620, China; Engineering Research Center of Digitized Textile and Fashion Technology, Ministry of Education, Donghua University, Shanghai, 201620, China.

Summary

This study introduces a novel dual-pathway mask ranking method to purify AI models from backdoor attacks. The technique effectively removes malicious triggers while preserving model accuracy, enhancing AI security.