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Ultra-Low-Bubble-Density Quartz Glass Enabled by Stepwise Calcination of High-Purity Synthetic Quartz Powder
Woo-Guk Lee1,2, Chang-Jin Lee2,3, Ji-Ho Choi3,4
1Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 04763, Republic of Korea.
Nanomaterials (Basel, Switzerland)
|July 27, 2026
Summary
This study details removing hydrogen bonds from synthetic quartz powders via calcination. A novel stepwise process significantly reduces hydroxyl (OH) concentration and bubble formation in fused quartz glass.
Area of Science:
- Materials Science
- Chemical Engineering
- Glass Science
Background:
- High-purity synthetic quartz powders are crucial for semiconductor manufacturing, particularly for quartz crucibles and ware.
- Sol-gel derived quartz powders contain hydrogen bonds that cause bubble formation during glass fusion, compromising product quality.
Purpose of the Study:
- To investigate the behavior of hydrogen bond removal in synthetic quartz powders as a function of calcination temperature.
- To establish an optimized calcination process for minimizing hydrogen content and subsequent bubble formation in fused quartz glass.
Main Methods:
- Investigated hydrogen bond removal using mass loss, Brunauer-Emmett-Teller (BET) specific surface area, tap density, and Fourier transform infrared (FT-IR) spectroscopy.
- Analyzed the removal temperatures for physisorbed water, vicinal/geminal silanols, and isolated silanols.
Main Results:
- Physisorbed water and weakly bonded hydroxyl groups (~3350 cm⁻¹) were removed between 200-600 °C.
- Vicinal/geminal silanols (~3650 cm⁻¹) were removed between 700-1000 °C.
- Isolated silanols (~3745 cm⁻¹) were removed above 1100 °C.
Conclusions:
- A stepwise calcination process (300 °C for 5h, 700 °C for 5h, 1200 °C for 10h) was developed based on observed hydrogen bond removal behavior.
- This optimized process reduced hydroxyl (OH) concentration to 3.6 ppm.
- The developed process significantly decreased bubble density in fused quartz glass to 0.6 bubbles cm⁻³.

