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High-repetition-rate GaAs-on-SiN mode-locked laser using a Fabry-Pérot cavity
Optics Letters
|July 31, 2026
Summary
We developed a 23.3 GHz mode-locked laser on a silicon nitride platform using micro-transfer printing. This breakthrough enables high-repetition-rate pulse sources for advanced photonic circuits.
Area of Science:
- Photonics
- Materials Science
- Electrical Engineering
Background:
- Silicon nitride (SiN) photonics offers a scalable platform for integrated optical circuits.
- Mode-locked lasers are crucial for generating high-speed optical pulses used in communications and sensing.
- Heterogeneous integration is key to combining different material functionalities on a single chip.
Purpose of the Study:
- To demonstrate a 23.3 GHz mode-locked laser integrated onto a silicon nitride platform.
- To explore the potential of micro-transfer printing for heterogeneous integration of III-V materials on silicon nitride.
- To provide a scalable solution for on-chip optical pulse generation.
Main Methods:
- Heterogeneous integration of GaAs-on-SiN using micro-transfer printing.
- Fabrication of a compact Fabry-Pérot cavity with a saturable absorber.
- Utilizing colliding-pulse, second-harmonic mode locking.
- Characterization using optical power measurements and autocorrelation.
Main Results:
- Successful demonstration of a 23.3 GHz mode-locked laser on a SiN platform.
- Achieved up to 1 mW on-chip optical power from a single output port.
- Generated eight comb lines within a 10 dB optical bandwidth.
- Measured a deconvolved pulse width of 4.8 ps via autocorrelation.
Conclusions:
- Micro-transfer printing enables efficient heterogeneous integration of GaAs-on-SiN for photonic applications.
- The demonstrated laser is a viable high-repetition-rate pulse source for nonlinear SiN photonic circuits.
- This approach offers a scalable pathway toward advanced integrated photonic systems.

