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Surface Charge Dependent Foliar Applied Silicon Quantum Dots Enhance Soybean Salt Tolerance Through
Zhidi Chen1, Yunqian Liu1, Tianxing Shi1
1State Key Laboratory for Crop Stress Resistance and High-Efficiency Production, Shaanxi Key Laboratory of Agricultural and Environmental Microbiology, College of Life Sciences, Northwest A&F University, Shaanxi, Yangling, China.
Abstract:
Here, we evaluated foliar-applied silicon quantum dots (SiQDs) with different surface charges on soybean salt tolerance. Positively charged SiQDs (P-SiQDs) exhibited stronger foliar retention and penetration than negatively charged SiQDs (N-SiQDs), resulting in a 35.3% higher silicon accumulation in leaves. Under 200 mM NaCl stress, foliar application of P-SiQDs increased shoot dry weight and reduced the Na+/K+ ratio. Compared with N-SiQDs, P-SiQDs more effectively alleviated salt-induced damage to thylakoid ultrastructure and improved photosynthetic performance. A life cycle field pot trial further showed that SiQDs increased the 100-seed weight by 20.1%-25.9% under salt stress. Leaf metabolomics showed significant alterations in lipid metabolite pathways associated with redox homeostasis, accompanied by shifts in the phyllosphere microbiome. P-SiQDs increased the abundance of Chloroflexota, Actinomycetota, and genera such as Paenarthrobacter, Variovorax, and Xanthobacter. Meanwhile, the phyllosphere microbiome shifted toward life-history strategies related to growth, resource acquisition, and salt stress tolerance. In addition, P-SiQDs promoted root growth, nodulation, and nitrogenase activity, leghemoglobin content, and total nitrogen accumulation, together with changes in root exudate composition and the enrichment of salt-tolerant rhizosphere bacteria, including Sphingomonas and Novosphingobium. These findings indicate that surface charge modification is an effective strategy to enhance the efficiency of foliar nano-fertilizer application.
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