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Updated: Aug 13, 2026

Demonstration of Equal-Intensity Beam Generation by Dielectric Metasurfaces
Published on: June 7, 2019
Direct printing of metasurfaces using formulated optical materials
Hyunjung Kang1, Eunji Lee2, Yujin Park1
1Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, Republic of Korea.
Abstract:
Optical metasurfaces represent a promising technology for compact, lightweight and multifunctional optical devices; yet, their practical implementation remains challenging because of the need for high-refractive-index (high-index) materials, complex fabrication processes and limited substrate compatibility. Conventional top-down approaches relying on deposition, electron-beam lithography and etching are expensive and typically restricted to rigid substrates, hindering scalability and integration with flexible platforms. Nanoimprint lithography is a cost-effective, high-throughput alternative for metasurface fabrication; nevertheless, the low refractive index of conventional imprint resins fundamentally limits device performance. Here, we describe the fabrication of optical metasurfaces using a printable high-index composite material known as nanoparticle-embedded resin (nanoPER). By embedding high-index nanoparticles into a curable resin matrix, nanoPER achieves an effective refractive index above 1.8 at the target wavelength and enables single-step replication of functional nanostructures on a wide range of substrates, including flexible and curved surfaces. The procedure focuses on TiO2 nanoPER and provides a reproducible and comprehensive guide covering resin formulation, nanoimprint lithography process parameters and optical characterization. By emphasizing scalability and versatility, this protocol supports the translation of metasurface research into real-world applications such as light detection and ranging, compact imaging and integrated photonics. The entire process can be completed within 1-2 days and can be performed by researchers with experience in nanofabrication and optical measurements.

