A Gated Artifact Management Pipeline for Low-Density Eyewear EEG

Andrea Costanzo Palmisciano1, Andrea Farabbi1, Francesco Latino2

  • 1Department of Electronics, Information and Bioengineering, Politecnico di Milano, via Ponzio, 34/5, Milano, 20133, Italy.

Summary

This study presents an efficient artifact management method for wearable eyewear electroencephalography (EEG). The system accurately detects, classifies, and removes artifacts, optimizing processing for clean neural data.

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