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Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
Published on: September 28, 2019
Scale-bridging characterization of iron oxide thin films obtained by reactive magnetron sputtering
Nina A Kosian1, Peter Schweizer1, James P Best1
1Max Planck Institute for Sustainable Materials, Max-Planck-Str. 1, 40237 Düsseldorf, Germany. l.vogl@mpi-susmat.de.
Abstract:
Iron oxides are promising candidates for sustainable energy applications due to being low cost, earth abundant and environmentally friendly. However, precise control over microstructure including phase formation remains a critical challenge for optimizing their functional properties. In this study, we investigated the influence of cathode power and substrate temperature on the microstructure and phase formation of iron oxide thin films by reactive DC magnetron sputtering. Two series were deposited at cathode power of 100 W (series I) and 250 W (series II) with variating substrate temperature, from no intentional heating up to 600 °C. We employed a scale-bridging characterization approach, combining X-ray diffraction (XRD), scanning electron microscopy (SEM), and scanning-/transmission electron microscopy (STEM/TEM) with advanced techniques including energy dispersive X-ray spectroscopy (EDS), electron energy loss spectroscopy (EELS) and four-dimensional STEM (4D-STEM). We showed, that by carefully tuning the deposition parameters, iron oxide films can be synthesized with phases ranging from pure Fe3O4 to pure α-Fe2O3, as well as the formation of metastable nano-sized γ-Fe2O3 grains. At high sputtering rate the substrate temperature stabilized different phase from α-Fe2O3 to Fe3O4 with increasing temperature. At low sputtering rates, elevated temperatures enables grain growth and the formation of a bimodal grain-sized α-Fe2O3 film. With the help of EELS analysis we identified the metastable γ-Fe2O3 phase. Our findings highlight the critical role of deposition parameters for controling oxide phase and microstructure formation of iron oxide thin films during reactive sputtering. This offers a parthway to tailor their properties for applications like solar water splitting or oxygen evolution reactions.

