Thermally enhanced resistive switching in interface-engineered AgHfO3-x/Al2O3 memristors via trap depopulation for

Swaraj Mukherjee1, Mubashir M Ganaie2,3, Ayan Chatterjee1

  • 1Department of Materials Engineering, Indian Institute of Technology Jodhpur, Jodhpur 342030, India.

Materials Horizons
|September 8, 2026
PubMed

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