Deposition-Free Anti-Reflective Nanomembrane Lamination for Ultrathin Photodetectors

The transition toward function-centric three-dimensional heterogeneous integration (3DHI) requires ultrathin photodetectors with strong photoresponse and compatibility with vertical stacking. Monolayer transition metal dichalcogenides (TMDCs) are promising active layers for such systems but suffer from intrinsically limited light absorption. Moreover, strategies for enhancing light absorption in monolayer TMDCs without compromising their electronic quality remain limited, as direct deposition can introduce defects and interfacial disorder. Here, we report deposition-free vdW lamination of an anti-reflective MgF2 nanomembrane onto monolayer MoS2. Uniform MgF2 nanomembranes are formed on an amorphous carbon monolayer (ACM) template and cleanly released at the MgF2/ACM interface, enabling integration without compromising the integrity of monolayer MoS2 while enhancing its photoresponse. Applied to mixed-dimensional 3D/2D/3D stacked MgF2/MoS2/Si photodetectors, this approach enables broadband visible-to-near-infrared detection with a maximum responsivity of 51.36 A/W and a measured-noise-based detectivity of 2.27 × 1012 Jones, demonstrating compatibility with vertically stacked 3DHI platforms and effective photoresponse enhancement.