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Updated: Sep 19, 2026
Reductive Electropolymerization of a Vinyl-containing Poly-pyridyl Complex on Glassy Carbon and Fluorine-doped Tin Oxide Electrodes
Published on: January 30, 2015
Controlling the plasma etch rate of poly(4-vinylpyridine) using supramolecular complexation
Caden Chittick1, Shaghayegh Abtahi1, Nayanathara Hendeniya1
1Department of Materials Science and Engineering, Iowa State University, Ames, Iowa, 50011, USA. boyce@iastate.edu.
Abstract:
Supramolecular poly(4-vinylpyridine) complexes were developed as a tunable platform for soft plasma etching. Etch rate can be significantly enhanced while maintaining homogeneous etching between the polymer and complexing molecule. This method is extended to self-assembled block copolymers where pattern transfer was achieved by increasing the etch contrast in the supramolecular domain.
