Phosphoric acid-etched boron nitride as a single-atom support for boosting CO2 electroreduction at high current

Xuan Li1, Yu-Ting Wang1, Wei-Zhen Deng1

  • 1Key Lab of Fluorine and Silicon for Energy Materials and Chemistry of Ministry of Education, College of Chemistry and Materials, Jiangxi Normal University Nanchang 330022 China caolm@jxnu.edu.cn huanghh@jxnu.edu.cn hct@jxnu.edu.cn.

Chemical Science
|October 20, 2026
PubMed

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