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Published on: January 6, 2016
Phosphoric acid-etched boron nitride as a single-atom support for boosting CO2 electroreduction at high current
Xuan Li1, Yu-Ting Wang1, Wei-Zhen Deng1
1Key Lab of Fluorine and Silicon for Energy Materials and Chemistry of Ministry of Education, College of Chemistry and Materials, Jiangxi Normal University Nanchang 330022 China caolm@jxnu.edu.cn huanghh@jxnu.edu.cn hct@jxnu.edu.cn.
Abstract:
Designing adjustable and robust support materials remains a critical challenge for enhancing the industrial-level CO2 electroreduction performance of single-atom catalysts. Herein, we report a defective and phosphate-modified boron nitride (BN) support via a facile phosphoric acid etching strategy to anchor single nickel atoms. The optimized electrocatalyst delivers an outstanding maximum CO faradaic efficiency of 97.6 ± 1.2% in an H-cell and a large CO partial current density of 148.6 ± 2.3 mA cm-2 in a gas diffusion electrode-based flow cell and retains high CO selectivity during 87 h of stable operation. A variety of characterization studies including operando spectroscopy combined with theoretical calculations reveal that phosphoric acid etching redistributes the electronic structures of the interface as well as Ni centers, which significantly optimizes the *CO adsorption. Moreover, the surface phosphate species may play a critical role in stabilizing the key *COOH intermediate. This work not only provides a support material for achieving performance gain of transition metal single atoms, but also offers new insights into interfacial molecule-mediated CO2 electrochemical conversion.