Quantifying Microscale Gain in Photorefractive Semiconductors by Transient White-Light Interferometry
Chuanxiu Jiang1,2,3, Wenna Du1,2,4, Shuai Yue1,2,4
1CAS Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing100190, P. R. China.
Abstract:
Accurate optical gain measurement at the microscale has long been plagued by photorefractive effects that distort optical spectroscopy signals under high excitation conditions. Here, we develop a phase-sensitive microscopic transient white-light interferometry that disentangles gain dynamics from transient refractive index changes, enabling direct access to intrinsic gain in photorefractive materials. Applying this method to CsPbBr3 single-crystal microplatelets, we reveal that conventional measurements underestimate gain by up to 20%. The corrected gain exhibits a duration of 500 ps and a bandwidth of ∼30 nm. We further uncover that the optical confinement factor governs a nonmonotonic thickness dependence of gain, peaking at ∼140 nm. Exploiting this optimal cavity length in a DBR structure yields a lasing threshold of 0.07 μJ·cm-2. This work presents a general method for measuring gain in photorefractive micronano materials and offers design guidelines for high-performance microlasers and integrated photonic circuits.


