Highly tunable mid-infrared perfect absorber based on unpatterned α-MoO3 integrated with an inverted metasurface
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Updated: Nov 1, 2026

Simulation, Fabrication and Characterization of THz Metamaterial Absorbers
Published on: December 27, 2012
Daxing Dong1,2, Guohao Zhang1,2, Jingkai Miao1,2
1College of Physics, Nanjing University of Aeronautics and Astronautics, Nanjing 211106, China.
Abstract:
α-phase molybdenum trioxide (α-MoO3) is a promising van der Waals crystal for mid-infrared nanophotonics. However, direct patterning of this material typically induces severe lattice damage and edge scattering losses. Here, we propose a tunable mid-infrared perfect absorber that integrates a continuous, unpatterned α-MoO3 film with an inverted dielectric-metal (SiO2/Au) metasurface. This architecture leverages guided-mode resonances within the patterned SiO2 layer to concentrate strong evanescent fields into the intact α-MoO3 film. Full-wave simulations and temporal coupled-mode theory (TCMT) corroborate that the system satisfies the critical coupling condition, thereby achieving near-unity absorption (>98%). Owing to the pronounced in-plane optical anisotropy of α-MoO3, the absorber exhibits a highly polarization-dependent response. Specifically, the transverse electric (TE) polarization shows relatively robust angular and polarization responses, whereas the transverse magnetic (TM) polarization exhibits stronger angular sensitivity with pronounced spectral evolution at large incidence angles. Furthermore, the resonant wavelength can be effectively tuned by adjusting the geometric parameters and the surrounding dielectric environment. By circumventing direct etching of the van der Waals crystal, this design offers a promising avenue for polarization-multiplexed optoelectronics, directional thermal emitters, and mid-infrared sensing.
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