Inverse frequency dependence of simultaneous tone-on-tone masking patterns at low levels

Using the Békésy tracking method, tone-on-tone masking patterns were measured with eight subjects at eight masker frequencies between 250 Hz and 6.03 kHz. Masking patterns were obtained for five masker levels between 20 and 60 dB SPL. Test-tone frequencies were chosen within two critical bands above and below the masker frequency. A level-dependent frequency asymmetry of masking was observed at all masker frequencies except at 250 Hz. At low levels there was a greater spread of masking towards the lower frequencies than toward the higher frequencies, but at high levels there was a greater spread of masking towards the higher frequencies than toward the lower frequencies. Only at masker levels of 40 dB SPL were the masking patterns approximately symmetrical.