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Intraoperative custom contouring of the mandible
1Manhattan Eye, Ear, and Throat Hospital, New York, NY.
Archives of Otolaryngology--Head & Neck Surgery
|February 1, 1994
Summary
A quantitative approach to augmentation mentoplasty using Silastic implants achieved accurate chin augmentation in 98% of patients. Intraoperative customization with a Silastic extension wafer proved effective for precise results.
Area of Science:
- Plastic Surgery
- Facial Aesthetic Surgery
- Quantitative Surgical Techniques
Background:
- Augmentation mentoplasty aims to improve chin projection and facial aesthetics.
- Achieving consistent and accurate results in mentoplasty can be challenging.
- Silastic implants are commonly used for chin augmentation.
Purpose of the Study:
- To apply a quantitative approach to augmentation mentoplasty using Silastic implants.
- To achieve consistently accurate results in chin augmentation procedures.
- To introduce and evaluate a Silastic extension wafer for custom implant contouring.
Main Methods:
- A case series study was conducted in a private practice setting.
- One hundred patients undergoing elective facial cosmetic surgery were included.
- Ideal profile augmentation was defined as chin projection within 2 mm of a vertical line from the lower lip.
Main Results:
- A quantitative approach to augmentation mentoplasty resulted in ideal profile augmentation in 98 out of 100 patients.
- The Silastic extension wafer facilitated easy intraoperative customization of implants.
- High accuracy rates were achieved in achieving the desired chin projection.
Conclusions:
- A quantitative approach to augmentation mentoplasty provides consistently accurate outcomes.
- Intraoperative customization of Silastic implants is crucial for successful augmentation mentoplasty.
- The Silastic extension wafer is an effective tool for intraoperative implant customization.