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Identification of two genes on chromosome 4 that determine resistance to plasmacytoma induction in mice

M Potter1, E B Mushinski, J S Wax

  • 1Laboratory of Genetics, National Cancer Institute, NIH, Bethesda, Maryland 20892.

Cancer Research
|February 15, 1994
PubMed

Insights

Genetic analysis reveals two key genes, Pctr1 and Pctr2, on chromosome 4 confer resistance to plasmacytoma development in mice. These genes limit tumor progression rather than initial formation.

Area of Science:

  • Immunology
  • Genetics
  • Oncology

Background:

  • BALB/cAn mice are highly susceptible to plasmacytoma (PCT) induction by paraffin oil, while DBA/2 mice are resistant.
  • PCTs develop from atypical plasma cell foci within oil granulomas on mesenteric surfaces.
  • Tumor progression is indicated by the development of six or more foci.

Purpose of the Study:

  • To identify genes responsible for the dominant resistance to plasmacytoma development in DBA/2 mice.
  • To investigate the genetic control of the resistant phenotype using congenic mouse strains.

Main Methods:

  • Construction and analysis of BALB/c.DBA/2 (C.D2) congenic strains.
  • Assessment of susceptibility and resistance to PCT development over 365 days.
  • Mapping of resistance genes to specific chromosomal locations.

Main Results:

  • Congenic strains with DBA/2 alleles on chromosomes other than chromosome 4 remained susceptible.
  • Congenic strains carrying DBA/2 segments on chromosome 4 exhibited resistance.
  • At least two resistance genes, Pctr1 and Pctr2, were localized to the distal half of chromosome 4.
  • Pctr1 and Pctr2 conferred a partial resistant phenotype, limiting tumor progression but not initial focus formation.

Conclusions:

  • The resistance to plasmacytoma development in DBA/2 mice is controlled by at least two genes on chromosome 4.
  • Pctr1 and Pctr2 influence the autonomy of plasma cell foci, thereby affecting tumor progression.
  • These findings provide insights into the genetic mechanisms underlying plasmacytoma development and resistance.

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