A new penumbra generator for electron fields matching

Abutment of two or more electron fields to irradiate extended areas may lead to significant dose inhomogeneities in the junction region. This paper describes the geometric and dosimetric characteristics of a device developed to modify the penumbra of an electron beam and thereby improve the dose uniformity in the overlap region when fields are abutted. The device is a Lipowitz metal block placed on top of the electron applicator's insertion plate and positioned to stop part of the electron beam on the side of field abutment. The air-scattered electrons beyond the block increase the penumbra width from about 1.4 to 2.7-3.4 cm with an SSD of 100 cm. The modified penumbra is broad and almost linear at all depths for the 9 and 12 MeV electron beams used in this study. Film dosimetry was used to obtain beam profiles and isodose distributions of single modified beams and matched fields of 9 and 12 MeV as well as matched fields of both energies. Computer simulation was used to optimize the skin gap to be used and to quantify the dose uniformity as a function of the field separation for both modified and nonmodified beams. Results are presented for various field configurations. Without the penumbra generator, lateral setup errors of 2-3 mm may introduce dose variations of 20% or more in the junction region. Similar setup errors cause less than 5% dose variations when the penumbra generator is used to match the fields. The potential of the technique for the irradiation of curved surfaces is presented. A possible method for implementing the modified penumbra into a conventional treatment planning system is evaluated.