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Plasmid-determined resistance to hexachlorophene in Pseudomonas aeruginosa
Antimicrobial Agents and Chemotherapy
|April 1, 1978
Abstract:
Plasmid-containing strains of Pseudomonas aeruginosa were screened for resistance to disinfectants. Two plasmids, pMG1 and pMG2, were found to determine hexachlorophene resistance.
Insights
Two plasmids, pMG1 and pMG2, were identified in Pseudomonas aeruginosa strains. These plasmids confer resistance to the disinfectant hexachlorophene, impacting bacterial control strategies.
Area of Science:
- Microbiology
- Molecular Biology
- Antimicrobial Resistance
Background:
- Pseudomonas aeruginosa is an opportunistic pathogen known for its intrinsic and acquired resistance mechanisms.
- Disinfectants are crucial for controlling bacterial infections, but resistance can compromise their efficacy.
- Plasmids are extrachromosomal DNA elements that can carry genes conferring resistance traits.
Purpose of the Study:
- To screen plasmid-containing Pseudomonas aeruginosa strains for resistance to disinfectants.
- To identify specific plasmids responsible for conferring resistance to hexachlorophene.
Main Methods:
- Screening of Pseudomonas aeruginosa strains harboring plasmids.
- Phenotypic testing for resistance to hexachlorophene.
- Plasmid identification and characterization.
Main Results:
- Two plasmids, designated pMG1 and pMG2, were identified in the screened strains.
- Both pMG1 and pMG2 were found to confer resistance to the disinfectant hexachlorophene.
Conclusions:
- Plasmids pMG1 and pMG2 play a significant role in hexachlorophene resistance in Pseudomonas aeruginosa.
- Understanding plasmid-mediated resistance is crucial for developing effective disinfection protocols and combating bacterial infections.