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ACS Sensors|July 21, 2017
Response of Gallium Nitride Chemiresistors to Carbon Monoxide is Due to Oxygen ContaminationRavi Mohan Prasad, Stefan Lauterbach, Hans-Joachim Kleebe, et al.
Chemphyschem : a European Journal of Chemical Physics and Physical Chemistry|June 28, 2019
Zirconium Oxycarbide: A Highly Stable Catalyst Material for Electrochemical Energy ConversionNiusha Shakibi Nia, Daniel Hauser, Lukas Schlicker, et al.
Physical Chemistry Chemical Physics : PCCP|July 18, 2017
Surface chemistry and stability of metastable corundum-type In2O3Eva-Maria Köck, Michaela Kogler, Chen Zhuo, et al.
Nanoscale|September 27, 2012
Nanoscaled tin dioxide films processed from organotin-based hybrid materials: an organometallic route toward metal oxide gas sensorsLaetitia Renard, Odile Babot, Hassan Saadaoui, et al.
Dalton Transactions (Cambridge, England : 2003)|March 18, 2011
A molecular approach to Cu doped ZnO nanorods with tunable dopant contentMikhail Pashchanka, Rudolf C Hoffmann, Aleksander Gurlo, et al.
Angewandte Chemie (International Ed. in English)|November 15, 2022
Zirconium Carbide Mediates Coke-Resistant Methane Dry Reforming on Nickel-Zirconium CatalystsLeander Haug, Christoph Thurner, Maged F Bekheet, et al.
Crystengcomm|April 2, 2019
On the structural stability of crystalline ceria phases in undoped and acceptor-doped ceria materials under in situ reduction conditionsMaged F Bekheet, Matthias Grünbacher, Lukas Schlicker, et al.
Dalton Transactions (Cambridge, England : 2003)|April 8, 2015
A study on the thermal conversion of scheelite-type ABO4 into perovskite-type AB(O,N)3Wenjie Li, Duan Li, Xin Gao, et al.
Biomedicines|February 25, 2022
Ceramic Stereolithography of Bioactive Glasses: Influence of Resin Composition on Curing Behavior and Green Body PropertiesQirong Chen, Franziska Schmidt, Oliver Görke, et al.
Catalysis Science & Technology|August 30, 2021
Steering the methanol steam reforming reactivity of intermetallic Cu-In compounds by redox activation: stability vs. formation of an intermetallic compound-oxide interfaceKevin Ploner, Andrew Doran, Martin Kunz, et al.
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