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ACS Nano|October 18, 2013
Consequences of surface neutralization in diblock copolymer thin filmsSangwon Kim, Christopher M Bates, Anthony Thio, et al.
ACS Nano|March 30, 2012
Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applicationsJulia D Cushen, Issei Otsuka, Christopher M Bates, et al.
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