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Benjamin Aaron Wasserman

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ACS Applied Materials & Interfaces|April 14, 2026

Nanogravure Printing for PFAS-Free Water-Repellent Textiles with Hierarchical RoughnessAdél Szerlauth, Benjamin Aaron Wasserman, David De Smet, et al.

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Search research articles

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ACS Applied Materials & Interfaces|April 14, 2026

Nanogravure Printing for PFAS-Free Water-Repellent Textiles with Hierarchical RoughnessAdél Szerlauth, Benjamin Aaron Wasserman, David De Smet, et al.

Pageof 1