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Chia-Hsun Hsu

Showing results (1-10 of 20) with videos related to

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Nanomaterials (Basel, Switzerland)|January 9, 2026
Plasma-Enhanced Atomic Layer Deposition of AlF<sub>3</sub> Antireflective Coatings via Pulse-Time Control of Fluorine Radical ReactionsJing Zhang, Zhixuan Zhang, Chia-Hsun Hsu, et al.
Materials (Basel, Switzerland)|February 5, 2021
Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO<sub>2</sub> Thin Films via Atomic Layer DepositionPao-Hsun Huang, Zhi-Xuan Zhang, Chia-Hsun Hsu, et al.
Molecules (Basel, Switzerland)|November 4, 2020
Air Annealing Effect on Oxygen Vacancy Defects in Al-doped ZnO Films Grown by High-Speed Atmospheric Atomic Layer DepositionChia-Hsun Hsu, Xin-Peng Geng, Wan-Yu Wu, et al.
Nanomaterials (Basel, Switzerland)|April 30, 2021
Properties and Mechanism of PEALD-In<sub>2</sub>O<sub>3</sub> Thin Films Prepared by Different Precursor Reaction EnergyMing-Jie Zhao, Zhi-Xuan Zhang, Chia-Hsun Hsu, et al.
Materials (Basel, Switzerland)|August 5, 2017
Low Cost Local Contact Opening by Using Polystyrene Spheres Spin-Coating Method for PERC Solar CellsChia-Hsun Hsu, Chih-Hsiang Yang, Yi-Han Wang, et al.
Nanoscale Research Letters|April 20, 2019
Enhanced Si Passivation and PERC Solar Cell Efficiency by Atomic Layer Deposited Aluminum Oxide with Two-step Post AnnealingChia-Hsun Hsu, Yun-Shao Cho, Wan-Yu Wu, et al.
Nanomaterials (Basel, Switzerland)|May 5, 2021
Deposition and Characterization of RP-ALD SiO<sub>2</sub> Thin Films with Different Oxygen Plasma PowersXiao-Ying Zhang, Yue Yang, Zhi-Xuan Zhang, et al.
Nanomaterials (Basel, Switzerland)|July 26, 2019
Deposition of Silicon-Based Stacked Layers for Flexible Encapsulation of Organic Light Emitting DiodesChia-Hsun Hsu, Yang-Shih Lin, Hsin-Yu Wu, et al.
International Journal of Molecular Sciences|December 23, 2022
Growth of GaN Thin Films Using Plasma Enhanced Atomic Layer Deposition: Effect of Ammonia-Containing Plasma Power on Residual Oxygen CaptureShicong Jiang, Wan-Yu Wu, Fangbin Ren, et al.
Molecules (Basel, Switzerland)|December 11, 2022
Deposition Mechanism and Properties of Plasma-Enhanced Atomic Layer Deposited Gallium Nitride Films with Different Substrate TemperaturesFang-Bin Ren, Shi-Cong Jiang, Chia-Hsun Hsu, et al.
Pageof 2

Showing results (1-10 of 20) with videos related to

Sort By:
Pageof 2
Nanomaterials (Basel, Switzerland)|January 9, 2026
Plasma-Enhanced Atomic Layer Deposition of AlF<sub>3</sub> Antireflective Coatings via Pulse-Time Control of Fluorine Radical ReactionsJing Zhang, Zhixuan Zhang, Chia-Hsun Hsu, et al.
Materials (Basel, Switzerland)|February 5, 2021
Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO<sub>2</sub> Thin Films via Atomic Layer DepositionPao-Hsun Huang, Zhi-Xuan Zhang, Chia-Hsun Hsu, et al.
Molecules (Basel, Switzerland)|November 4, 2020
Air Annealing Effect on Oxygen Vacancy Defects in Al-doped ZnO Films Grown by High-Speed Atmospheric Atomic Layer DepositionChia-Hsun Hsu, Xin-Peng Geng, Wan-Yu Wu, et al.
Nanomaterials (Basel, Switzerland)|April 30, 2021
Properties and Mechanism of PEALD-In<sub>2</sub>O<sub>3</sub> Thin Films Prepared by Different Precursor Reaction EnergyMing-Jie Zhao, Zhi-Xuan Zhang, Chia-Hsun Hsu, et al.
Materials (Basel, Switzerland)|August 5, 2017
Low Cost Local Contact Opening by Using Polystyrene Spheres Spin-Coating Method for PERC Solar CellsChia-Hsun Hsu, Chih-Hsiang Yang, Yi-Han Wang, et al.
Nanoscale Research Letters|April 20, 2019
Enhanced Si Passivation and PERC Solar Cell Efficiency by Atomic Layer Deposited Aluminum Oxide with Two-step Post AnnealingChia-Hsun Hsu, Yun-Shao Cho, Wan-Yu Wu, et al.
Nanomaterials (Basel, Switzerland)|May 5, 2021
Deposition and Characterization of RP-ALD SiO<sub>2</sub> Thin Films with Different Oxygen Plasma PowersXiao-Ying Zhang, Yue Yang, Zhi-Xuan Zhang, et al.
Nanomaterials (Basel, Switzerland)|July 26, 2019
Deposition of Silicon-Based Stacked Layers for Flexible Encapsulation of Organic Light Emitting DiodesChia-Hsun Hsu, Yang-Shih Lin, Hsin-Yu Wu, et al.
International Journal of Molecular Sciences|December 23, 2022
Growth of GaN Thin Films Using Plasma Enhanced Atomic Layer Deposition: Effect of Ammonia-Containing Plasma Power on Residual Oxygen CaptureShicong Jiang, Wan-Yu Wu, Fangbin Ren, et al.
Molecules (Basel, Switzerland)|December 11, 2022
Deposition Mechanism and Properties of Plasma-Enhanced Atomic Layer Deposited Gallium Nitride Films with Different Substrate TemperaturesFang-Bin Ren, Shi-Cong Jiang, Chia-Hsun Hsu, et al.
Pageof 2