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Nanotechnology|January 19, 2023
Self-organization and dewetting kinetics in sub-10 nm diblock copolymer line/space lithographyXavier Chevalier, Gwenaelle Pound-Lana, Cindy Gomes Correia, et al.ACS Applied Materials & Interfaces|February 23, 2021
Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block CopolymersXavier Chevalier, Cindy Gomes Correia, Gwenaelle Pound-Lana, et al.Pageof 1