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Nature Nanotechnology|July 26, 2008
Chemical modification of the electronic conducting states in polymer nanodevicesN B Zhitenev, A Sidorenko, D M Tennant, et al.Optics Letters|September 24, 2009
Construction and test of phase zone plates for x-ray microscopyD M Tennant, J E Gregus, C Jacobsen, et al.Physical Review Letters|October 13, 2007
Using compound kinoform hard-x-ray lenses to exceed the critical angle limitK Evans-Lutterodt, A Stein, J M Ablett, et al.Applied Optics|September 8, 2010
Design and fabrication of high-efficiency beam splitters and beam deflectors for integrated planar micro-optic systemsS J Walker, J Jahns, L Li, et al.Applied Optics|September 22, 2010
Characterization of AZ PN114 resist for soft-x-ray projection lithographyK Early, D M Tennant, D Y Jeon, et al.Applied Optics|September 22, 2010
Mask technologies for soft-x-ray projection lithography at 13 nmD M Tennant, L A Fetter, L R Harriott, et al.Optics Letters|September 22, 2009
Soft-x-ray projection lithography: printing of 0.2-microm features using a 20:1 reductionD W Berreman, J E Bjorkholm, L Eichner, et al.Applied Optics|September 22, 2010
Soft-x-ray projection imaging with a 1:1 ring-field opticA A Macdowell, J E Bjorkholm, K Early, et al.Optics Letters|September 25, 2009
Diffraction-limited soft-x-ray projection imaging using a laser plasma sourceD A Tichenor, G D Kubiak, M E Malinowski, et al.Applied Optics|September 22, 2010
Soft-x-ray projection lithography experiments using Schwarzschild imaging opticsD A Tichenor, G D Kubiak, M E Malinowski, et al.Pageof 2