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Dinghai Rui

Showing results (1-10 of 7) with videos related to

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Nanotechnology|April 15, 2025
Enhancing lithographic accuracy by mitigating overlay errors via mask-induced thermal and mechanical optimizationDinghai Rui, Libin Zhang, Yayi Wei, et al.
Nanoscale Advances|September 8, 2025
Method of high-order advanced lithography overlay correction to enhance the manufacturing performance of integrated circuitsDinghai Rui, Libin Zhang, Yayi Wei, et al.
Optics Express|July 30, 2025
Impact of mask errors on imaging quality in surface plasmon lithographyDinghai Rui, LiBin Zhang, Yayi Wei, et al.
Optics Express|August 13, 2025
Super-resolution imaging using surface plasmon resonance cavity lithographyDinghai Rui, LiBin Zhang, Huwen Ding, et al.
Optics Express|November 22, 2024
Source and mask optimization for stability of reticle and wafer stagesHao Shen, Libin Zhang, Dinghai Rui, et al.
Nanotechnology|October 13, 2025
Effective intra-field overlay compensation in lithography via mask-level thermal and mechanical controlDinghai Rui, Libin Zhang, Yayi Wei, et al.
Optics Express|June 11, 2026
Region selective super-resolution imaging lithography for 3D via fabricationDinghai Rui, LiBin Zhang, Zongyu Lei, et al.
Pageof 1

Showing results (1-10 of 7) with videos related to

Sort By:
Pageof 1
Nanotechnology|April 15, 2025
Enhancing lithographic accuracy by mitigating overlay errors via mask-induced thermal and mechanical optimizationDinghai Rui, Libin Zhang, Yayi Wei, et al.
Nanoscale Advances|September 8, 2025
Method of high-order advanced lithography overlay correction to enhance the manufacturing performance of integrated circuitsDinghai Rui, Libin Zhang, Yayi Wei, et al.
Optics Express|July 30, 2025
Impact of mask errors on imaging quality in surface plasmon lithographyDinghai Rui, LiBin Zhang, Yayi Wei, et al.
Optics Express|August 13, 2025
Super-resolution imaging using surface plasmon resonance cavity lithographyDinghai Rui, LiBin Zhang, Huwen Ding, et al.
Optics Express|November 22, 2024
Source and mask optimization for stability of reticle and wafer stagesHao Shen, Libin Zhang, Dinghai Rui, et al.
Nanotechnology|October 13, 2025
Effective intra-field overlay compensation in lithography via mask-level thermal and mechanical controlDinghai Rui, Libin Zhang, Yayi Wei, et al.
Optics Express|June 11, 2026
Region selective super-resolution imaging lithography for 3D via fabricationDinghai Rui, LiBin Zhang, Zongyu Lei, et al.
Pageof 1