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The Review of Scientific Instruments|March 3, 2016
A load-lock compatible system for in situ electrical resistivity measurements during thin film growthJ J Colin, Y Diot, Ph Guerin, et al.The Review of Scientific Instruments|November 5, 2013
An experimental UHV AFM-STM device for characterizing surface nanostructures under stress/strain at variable temperatureY Nahas, F Berneau, J Bonneville, et al.Pageof 1