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Journal of the American Chemical Society|July 26, 2002
Competition and selectivity of organic reactions on semiconductor surfaces: reaction of unsaturated ketones on Si(100)-2 x 1 and Ge(100)-2 x 1George T Wang, Collin Mui, Charles B Musgrave, et al.Journal of the American Chemical Society|June 1, 2017
Formation of Germa-ketenimine on the Ge(100) Surface by Adsorption of tert-Butyl IsocyanideBonggeun Shong, Jong Suk Yoo, Tania E Sandoval, et al.The Journal of Physical Chemistry Letters|August 12, 2015
Unidirectional Adsorption of Bifunctional 1,4-Phenylene Diisocyanide on the Ge(100)-2 × 1 SurfaceBonggeun Shong, Tania E Sandoval, Allison M Crow, et al.Journal of the American Chemical Society|April 17, 2003
Competition and selectivity in the reaction of nitriles on ge(100)-2x1Michael A Filler, Collin Mui, Charles B Musgrave, et al.ACS Applied Materials & Interfaces|June 11, 2019
Growth of a Surface-Tethered, All-Carbon Backboned Fluoropolymer by Photoactivated Molecular Layer DepositionRichard G Closser, Mie Lillethorup, David S Bergsman, et al.Journal of Synchrotron Radiation|November 9, 2018
In situ observation of phase changes of a silica-supported cobalt catalyst for the Fischer-Tropsch process by the development of a synchrotron-compatible in situ/operando powder X-ray diffraction cellAdam S Hoffman, Joseph A Singh, Stacey F Bent, et al.Nanoscale|July 30, 2011
Nanoengineering and interfacial engineering of photovoltaics by atomic layer depositionJonathan R Bakke, Katie L Pickrahn, Thomas P Brennan, et al.Langmuir : the ACS Journal of Surfaces and Colloids|May 4, 2010
Reaction mechanism, bonding, and thermal stability of 1-alkanethiols self-assembled on halogenated Ge surfacesPendar Ardalan, Yun Sun, Piero Pianetta, et al.The Journal of Chemical Physics|February 10, 2017
Incomplete elimination of precursor ligands during atomic layer deposition of zinc-oxide, tin-oxide, and zinc-tin-oxideAdriaan J M Mackus, Callisto MacIsaac, Woo-Hee Kim, et al.ACS Applied Materials & Interfaces|June 2, 2022
Molecular Layer Deposition of a Hafnium-Based Hybrid Thin Film as an Electron Beam ResistJingwei Shi, Ajay Ravi, Nathaniel E Richey, et al.Pageof 107