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Talanta|May 22, 2012
Spectrometric analysis of process etching solutions of the photovoltaic industry--determination of HNO3, HF, and H2SiF6 using high-resolution continuum source absorption spectrometry of diatomic molecules and atomsStefan Bücker, Jörg Acker
Talanta|December 17, 2008
Chemical analysis of acidic silicon etch solutions I. Titrimetric determination of HNO(3), HF, and H(2)SiF(6)Antje Henßge, Jörg Acker
Analytical and Bioanalytical Chemistry|September 2, 2005
Method for precisely analyzing the stoichiometry of Na(x)CoO2-type superconductor materialJörg Acker, Gernot Krabbes
Talanta|December 17, 2008
Chemical analysis of acidic silicon etch solutions II. Determination of HNO(3), HF, and H(2)SiF(6) by ion chromatographyJörg Acker, Antje Henßge
Nanomaterials (Basel, Switzerland)|December 22, 2020
The Kinetics and Stoichiometry of Metal Cation Reduction on Multi-Crystalline Silicon in a Dilute Hydrofluoric Acid MatrixStefan Schönekerl, Jörg Acker
Nanomaterials (Basel, Switzerland)|April 30, 2021
The Role of the Molecular Hydrogen Formation in the Process of Metal-Ion Reduction on Multicrystalline Silicon in a Hydrofluoric Acid MatrixStefan Schönekerl, Jörg Acker
Physical Chemistry Chemical Physics : PCCP|September 25, 2023
Kinetic studies on acidic wet chemical etching of silicon in binary and ternary mixtures of HF, HNO3 and H2SiF6Anja Rietig, Jörg Acker
Physical Chemistry Chemical Physics : PCCP|January 18, 2022
Comprehensive stoichiometric studies on the reaction of silicon in HF/HNO3 and HF/HNO3/H2SiF6 mixturesAnja Rietig, Thomas Langner, Jörg Acker
Physical Chemistry Chemical Physics : PCCP|September 26, 2019
A revised model of silicon oxidation during the dissolution of silicon in HF/HNO3 mixturesAnja Rietig, Thomas Langner, Jörg Acker
Talanta|October 31, 2008
Titrimetric determination of silicon dissolved in concentrated HF-HNO3-etching solutionsAntje Henssge, Jörg Acker, Constanze Müller
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