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Langmuir : the ACS Journal of Surfaces and Colloids|April 22, 2015
Enhanced Step Coverage of TiO₂ Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer DepositionPeter Schindler, Manca Logar, J Provine, et al.
ACS Applied Materials & Interfaces|July 16, 2019
ALD HfO<sub>2</sub> Films for Defining Microelectrodes for Electrochemical Sensing and Other ApplicationsCharmaine Chia, Max M Shulaker, J Provine, et al.
Sensors and Actuators. B, Chemical|March 1, 2016
Depletion of cells and abundant proteins from biological samples by enhanced dielectrophoresisM Javanmard, S Emaminejad, C Gupta, et al.
Ultramicroscopy|May 11, 2016
Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stopsTimothy S English, J Provine, Ann F Marshall, et al.
Nano Letters|February 8, 2013
Single-cell photonic nanocavity probesGary Shambat, Sri-Rajasekhar Kothapalli, J Provine, et al.
Optics Express|February 12, 2014
Photonic crystal cavities in cubic (3C) polytype silicon carbide filmsMarina Radulaski, Thomas M Babinec, Sonia Buckley, et al.
Nano Letters|April 8, 2011
Linear increases in carbon nanotube density through multiple transfer techniqueMax M Shulaker, Hai Wei, Nishant Patil, et al.
Heliyon|March 4, 2024
New avenues for residual stress analysis in ultrathin atomic layer deposited free-standing membranes through release of micro-cantileversS Burgmann, M J Lid, H J D Johnsen, et al.
Nano Letters|January 10, 2012
Electrical and thermal conduction in atomic layer deposition nanobridges down to 7 nm thicknessShingo Yoneoka, Jaeho Lee, Matthieu Liger, et al.
ACS Applied Materials & Interfaces|June 14, 2016
Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric AcidYongmin Kim, J Provine, Stephen P Walch, et al.
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